Back to HomePageA two channel vacuum gauge with a digital indication and analogue outputs 0 - 5 V. The set includes two PRH 01 measuring heads, connecting cables and a rack module ACC. to DIN 43 700 electronic instrument, suitable for 3U 1/3 19" rack mounting, containing two analogue controllers, a microcontroller based digital LED display and keyboard and a power supply. The measured pressures are in an exponential format with two digit mantissa displayed.
The PIRANI VACUUM GAUGE PRVG 02 is for measurement and control of noncorrosive gases pressure designed in the range of 1.10-3 - 1.103 mbar in vacuum systems.
As a sensing element is a thin heated tungsten filament used, to one arm of a selfbalancing Whetstone bridge circuit connected, which keeps the filament temperature constant approximately to 410 K. The value of the current through the filament is proportional to the gas pressure. It is a temperature compensation of the "zero" provided. The three wire connection of the gauge head with the controller provides the independence of the signal value from the cable length.
TECHNICAL DATA
| Measuring range | mbar ACC. to N2 | 1.10-3 - 1.103 |
| Accuracy in the range 1.10-2 - 1.102 mbar | % | 20 |
| Analogue output | V DC | 0 - 5 / Rl >10kOhms |
| Measuring head connecting flange | KF ACC. to ISO | 16 |
| Power supply | V | 220, 50 Hz |
| Power consumption | VA | 8 |
| Dimensions | mm | 130 x 92 x 210 |
| Weight | kg | 1,5 |
AVAILABLE ON REQUEST
1. Relay outputs - 2 x 3 A / 220 V AC for each channel.
2. Table housing.
3. Serial interface RS 232 C for computer linking.
An one channel vacuum gauge with a digital indication and an analogue output 0 -5 V. The set includes a PNH 01 measuring head, a connecting cable and a rack module ACC. to DIN 43 700 electronic instrument, suitable for 3U 1/3 19" rack mounting, containing an analogue controller, a microcontroller based digital LED display and keyboard and a power supply. The measured pressures are in an exponential format with two digit mantissa displayed.
The PENNING VACUUM GAUGE PNVG 01 is for measurement and control of noncorrosive gases pressure designed in the range of 1.10-6 - 5.10-3 mbar in vacuum systems.
The measuring gauge head is as an inverse magnetron designed. The value of the discharge current in crossed electric and magnetic fields is proportional to the gas pressure and depends of the gas nature. Electrode's design and the values of the applied electric and magnetic fields provides self cleaning of the cathode and long term stability of the measurement by using together with oil filled vacuum pumps.
TECHNICAL DATA
| Measuring range | mbar ACC. to N2 | 1.10-6 - 5.10-3 |
| Accuracy in the range 1.10-2 - 1.102 mbar | % | -50 - +100 |
| Analogue output | V DC | 0 - 5 / Rl >10kOhms |
| Measuring head connecting flange | KF ACC. to ISO | 25 |
| Power supply | V | 220, 50 Hz |
| Power consumption | VA | 12 |
| Dimensions | mm | 130 x 92 x 250 |
| Weight | kg | 1,5 |
AVAILABLE ON REQUEST
1. Relay outputs - 2 x 3 A / 220 V AC.
2. Table housing.
3. PNH 02 measuring head for 1.10-8 - 1.10-3 mbar measurement.
4. Serial interface RS 232 C for computer linking.
COMBINED PENNING - PIRANI VACUUM GAUGE PRNVG 21
A three channel vacuum gauge with a digital indication and analogue outputs 0 - 5 V. The set includes two PRH 01 measuring heads, one PNH 01 measuring head, connecting cables and a rack module ACC. to DIN 43 700 electronic instrument, suitable for 3U 2/3 19" rack mounting, containing three analogue controllers, two separate microcontroller based digital LED displays and keyboards and a power supply. The measured pressures are in an exponential format with two digit mantissa displayed.
The COMBINED PENNING - PIRANI VACUUM GAUGE PRNVG 21 is for measurement and control of noncorrosive gases pressure designed in the range of 1.10-6 - 1.103 mbar in high vacuum systems. It is automatic switch on the Penning block from the Pirani 2 block provided. The gauge has all the specifications of the PRVG 02 and the PNVG 01.
TECHNICAL DATA
| Measuring range | mbar ACC. to N2 | 1.10-6 - 1.103 |
| Power supply | V | 220, 50 Hz |
| Power consumption | VA | 20 |
| Dimensions | mm | 274 x 92 x 250 |
| Weight | kg | 2,5 |
NOTE: The other technical data are equal with these, related for PRVG 02 and PNVG 01.
AVAILABLE ON REQUEST
1. Relay outputs - 2 x 3 A / 220 V AC for each channel.
2. Table housing.
3. PNH 02 measuring head for 1.10-8 - 1.10-3 mbar measurement.
4. Serial interface RS 232 C for computer linking.
AUTOMATIC VARIABLE LEAK VALVE AVLV 01
A low pressure control device with an analogue input. The set includes a servo valve with a connecting cable, a rack module ACC. to DIN 43 700 control unit, suitable for 3U 1/3 19" rack mounting and an information cable.
The AUTOMATIC VARIABLE LEAK VALVE AVLV 01 is for control and maintainig constant of the working gas pressure in vacuum systems designed. Each vacuum gauge with an analogue output 0 - 5 V or 0 - 10 V and a suitable measurig range is possible to produce a pressure - dependent electrical signal, which is necessary to be linked to the analogue input for reverse feedback.
The servo valve is electromagnetic with smooth control by means of a current varying through the valve coil. A PID - regulator compares the actual signal level with the task level and changes the valve coil current. It is an adjustment of the gain and the integrating time provided. A singlechip microcontroller (optional) provides memorising of process parameters (few separate programs) and selfadjustment of the gain and the integrating time for best working together with different pumping systems.
TECHNICAL DATA
| Flow range | mbar.l/s | 0 - 1; 5; 20 |
| Accuracy | % full scale | 0,5 |
| Integrating time | ms | 100 - 1000 |
| Leak rate | mbar.l/s | < 1.10-8 |
| Analogue input | V | 0 - 5; 10/Rl =10 kOhms |
| Servo valve connecting flange | KF ACC. to ISO | 12 |
| Power supply | V AC | 220, 50 Hz |
| Power consumption | VA | 10 |
| Dimensions | mm | 130 x 92 x 210 |
| Weight | kg | 1,0 |
AVAILABLE ON REQUEST
1. Analogue input 4 - 20 mA.
2. Second control channel.
3. Servo valve for corrosive gases.
4. Table housing.
5. Microprocessor based controller with PID - regulator.
6. Serial interface RS 232 C for computer linking (only together with p.5.).
MANUAL VARIABLE LEAK VALVE MVLV 01
The manual variable leak valve is of aluminium alloy made. It is for reproducible and smooth regulated noncorrosive gas flow leaking in a vacuum systems designed.
TECHNICAL DATA
| Adjustment range | mbar.l/s | 1.10-5 - 10 |
| Connecting flange | KF ACC. to ISO | 10 |
| Leak rate | mbar.l/s | < 1.10-8 |
| Dimensions | mm | 85 x 50 x 36 |
| Weight | kg | 0,25 |
AVAILABLE ON REQUEST
The manual variable leak valve, made of stainless steel with Teflon gaskets for corrosive gases applications
The right angle high vacuum valves with a manual or pneumatic actuation are of stainless steel, aluminium alloy and rubber made and are for working with noncorrosive gases designed.
TECHNICAL DATA
| Leak rate | mbar.l/s | < 1.10-8 | ||||||
| Connecting flange | KF ACC. to ISO | 16 25 40 | ||||||
| Conductance (at molecular gas flow) | l/s | 5 15 35 | ||||||
| Working pressure of the pneumatic drive | mm | 85 x 50 x 36 | ||||||
Weight
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THREE INCH PLANAR MAGNETRON PM/DC 3"
A three inch planar magnetron PM/DC 3" with a 1 kVA DC power stabilised power supply. The set includes a cathode, an electrical coaxial feedthrough, a power supply and a HV cable. It is an arc discharge supressor in the power supply incorporated. A singlechip microcontroller provides a digital indication of the process parameters on the three-digit dual LED display, keyboard control and memorising of process parameters (few separate programs).
The three inch planar magnetron PM/DC 3" is for sputtering or reactive sputtering of metal and semiconductor targets designed. The target tickness is in the range of 2 - 6 mm.
TECHNICAL DATA
Working gas pressure mbar 2.10-3 - 5.10-3
Discharge power VA 1000
Discharge voltage, max. V 700
Discharge current, max. A 1,5
Power density, max. W/cm2 22
Cooling water flow, min. l/min 5
Power supply V AC 3 x 380, 50 Hz
Dimensions:
cathode mm Ô 112 x H 70
power supply mm 442 x 265 x 347
electrical feedthrough hole mm Ô 26
AVAILABLE ON REQUEST
1. Two analogue outputs 0 - 5 V/Rl > 10 kOhm, proportional to the voltage and the current of the discharge.
2. Automatic switch off the power supply when the cooling water stops.
3. Serial interface RS 232 C for computer linking.
RECTANGULAR PLANAR MAGNETRON PM/DC 250
A rectangular planar magnetron PM/DC 250 with a 4 kVA DC power stabilised power supply. The set includes a cathode for mounting in the wall opening of the vacuum chamber, a power supply and a HV cable. It is an arc discharge suppressor in the power supply incorporated. A singlechip microcontroller provides a digital indication of the process parameters on the three-digit dual LED display, keyboard control and memorising of process parameters (few separate programs).
The rectangular planar magnetron PM/DC 250 is for sputtering or reactive sputtering of metal targets designed. The target tickness is in the range of 3 - 8 mm.
TECHNICAL DATA
Working gas pressure mbar 2.10-3 - 5.10-3
Discharge power kVA 4
Discharge voltage, max. V 700
Discharge current, max. A 6
Power density, max. W/cm2 20
Cooling water flow, min. l/min 10
Power supply V 3 x 380, 50 Hz
Dimensions:
target mm 246 x 80
cathode mm 285 x 117 x 49
power supply mm 442 x 440 x 580
clamping screws M 6
Number of the clamping screws 18
AVAILABLE ON REQUEST
1. Two analogue outputs 0 - 5 V/Rl > 10 kOhms, proportional to the voltage and the current of the discharge.
2. Automatic switch off the power supply when the cooling water stops.
3. Serial interface RS 232 C for computer linking.
RECTANGULAR PLANAR MAGNETRON PM/DC 400
A rectangular planar magnetron PM/DC 400 with a 6 kVA DC power stabilised power supply. The set includes a cathode for mounting inside the vacuum chamber, a power supply, a HV current feedthrough, two water feedthroughs and a HV cable. It is an arc discharge supressor in the power supply incorporated. A singlechip microcontroller provides a digital indication of the process parameters on the three-digit dual LED display, keyboard control and memorising of process parameters (few separate programs).
The rectangular planar magnetron PM/DC 400 is for sputtering or reactive sputtering of metal targets designed. The target tickness is in the range of 3 - 8 mm.
TECHNICAL DATA
Working gas pressure mbar 2.10-3 - 5.10-3
Discharge power kVA 6
Discharge voltage, max. V 700
Discharge current, max. A 10
Power density, max. W/cm2 20
Cooling water flow, min. l/min 12
Power supply V 3 x 380, 50 Hz
Dimensions:
target mm 405 x 80
cathode mm 450 x 122 x 60
power supply mm 442 x 440 x 580
HV feedthrough hole mm Ô27
water feedthrough holes mm Ô18
AVAILABLE ON REQUEST
1. Two analogue outputs 0 - 5 V/Rl > 10 kOhms, proportional to the voltage and the current of the discharge.
2. Automatic switch off the power supply when the cooling water stops.
3. Serial interface RS 232 C for computer linking.
RECTANGULAR PLANAR MAGNETRON PM/DC 500
A rectangular planar magnetron PM/DC 500 with a 9 kVA DC power stabilised power supply. The set includes a cathode for mounting inside the vacuum chamber, a power supply, a HV current feedthrough, two water feedthroughs and a HV cable. It is an arc discharge supressor in the power supply incorporated. A singlechip microcontroller provides a digital indication of the process parameters on the three-digit dual LED display, keyboard control and memorising of process parameters (few separate programs).
The rectangular planar magnetron PM/DC 500 is for sputtering or reactive sputtering of metal targets designed. The target tickness is in the range of 3 - 8 mm.
TECHNICAL DATA
Working gas pressure mbar 2.10-3 - 5.10-3
Discharge power kVA 9
Discharge voltage, max. V 700
Discharge current, max. A 20
Power density, max. W/cm2 20
Cooling water flow, min. l/min 20
Power supply V 3 x 380, 50 Hz
Dimensions:
target mm 515 x 91
cathode mm 565 x 133 x 60
power supply mm 442 x 440 x 580
HV feedthrough hole mm Ô27
water feedthrough holes mm Ô18
AVAILABLE ON REQUEST
1. Two analogue outputs 0 - 5 V/Rl > 10 kOhms, proportional to the voltage and the current of the discharge.
2. Automatic switch off the power supply when the cooling water stops.
3. Serial interface RS 232 C for computer linking.
UNIVERSAL PUMPDOWN PROCESS CONTROLLER UPPC 01
The programmable universal pumpdown process controller UPPC 01 is for automation of various high vacuum technological plants with discrete mode of operation designed. It supports both automatic or manual modes of operation and gives freedom of operator’s choice. The 3U 19” rack module includes two different keyboards - for manual operation and for user’s programming, a display, a microcontroller based programmable controller, interface boards and power supply. A serial interface RS 232 C is by request provided. The UPPC 01 uses analogue or relay outputs (if available) of the HV plant’s related vacuum gauges. It supports both modes of programming - with or without vacuum gauge relay outputs. The unit provides full continuous command execution checking and “three phase” continuous availability checking, alarm and “STOP”.
Residual programme supports all the necessary interlocks and alarm provided in both the modes of operation - manual or automatic. The keyboard provides easy configuring the required system design and process parameters. Any time is possible to change the mode of operation without any interruptions.
TECHNICAL DATA
Power supply V - 220, 50 Hz
Power consumption VA - 50
DC output voltage V - 24, 330 mA
Digital inputs (24V, optoinsulated) - 16 (up to 24)
Relay outputs (220 V / 7,5 A) - 16 (up to 24)
Analogue inputs 0 - 5 V (0 - 10 V) - 5 (8 bit ADC)
Different kind of controlled pumps (progr.) - 1 - 3
Controlled valves (progr.) - 1 - 6
Controlled systems ( i.e. glow disch., gas inlet, magnetrons, etc.) (progr.) - 1 - 8
User program capabilities (parameters) - up to 64
AVAILABLE ON REQUEST
1. Serial interface RS 232 C for computer linking.
2. Three -digit LED display for analogue inputs display.
3. Clock.
FAMILY OF HIGH VACUUM PLANTS FOR BUTTON’S METALLIZATION
This is a family of high vacuum plants for button’s metallization with similar design and technological possibilities, but different capacity. There are developed technologies for producing of layers featuring different colours and multilayer coatings. Two kinds of plants with different design and possibilities are developed - for plastics buttons metallization or for metallic pieces coating.
PLANT MIX (general): Horizontal cylindrical vacuum chamber (different sizes), high vacuum pumping system, containing two stage rotary vane pump BW 100 (or D 60 A for smaller plants), oil diffusion pump DI 3000/6, related pneumatically driven valves and fittings, two planar magnetrons PM/DC 500 (PM/DC 400 with HVP 130MS) with MF pulsed DC power supply (optional), situated inside the vacuum chamber, planetary mechanism with two stages of freedom and fast change of substrates possibility, glow discharge cleaning system, DC bias of substrates system (optional), water cooling system, pneumosystem and “Power supply and control” unit. The “Power supply and control” unit contains of Combined Penning - Pirani vacuum gauge PRNVG 21, Universal programmable process controller UPPC 01, two automatic variable leak valves AVLV 01 and two Magnetron power control MPC 01 units.
TECHNICAL DATA
HVP 300MS HVP 180MS HVP 130MS
Vacuum chamber volume l 300 180 130
Chamber dimensions mm O750xL650 O600xL650 O550xL550
Power supply V 3x380, 50 Hz 3x380, 50 Hz 3x380, 50 Hz
Power consumption kVA 10 8 7
Cooling water consumption l/h 600 500 400
Working gas consumption l/h 5 4 3
Cycle duration min 30 25 20
Capacity in the cycle (O20) pcs. 2 500 1 600 1 000
Weight (app.) kg 850 750 650
AVAILABLE ON REQUEST
1. Multilayer coating technology for plastics buttons metallization (featuring different colours).
2. DC bias of substrates for metallic pieces coating.
3. MF pulsed DC power supply of magnetrons for reactive magnetron sputtering.
4. Substrates holder for loose state metallization of the buttons.
5. Technologies for multilayer hard coatings (nitrides, oxides or carbides) onto metal pieces.
NOTE: IT IS POSSIBLE TO CHANGE PLANT’S DESIGN TO SATISFY ALL CUSTOMER’S REQUIREMENTS. IF NEEDED, WE CAN DEVELOP ESSENTIALLY NEW DESIGN, WHICH WILL SUPPORT OTHER APPLICATIONS.
HIGH VACUUM PLANT FOR TRIODE CATHODE SPUTTERING OF A2B6 COMPOUNDS
This is high vacuum plant, especially designed for preparing of photoconductive A2B6 thin films onto flat Sital substrates for photocell mass production. The target material - sintered polycrystalline CdSe/CdS, determined used sputtering technology - triode cathode sputtering because of the low working pressure of Ar - 2.10-3 mbar, low rate of deposition - 30 nm/min, high temperature of substrate during the deposition - 250oC and uniformity of power density onto whole target surface. The technological equipment supports both modes of sputtering - DC or MF (25 kHz high voltage sine generator) and provides very high tickness uniformity ( better than 10% difference), high adhesion, uniform morphology and good repetition of layer’s properties.
PLANT MIX: Rectangular vacuum chamber 550x580x550 mm, made of electropollished stainless steel, high vacuum pumping system, containing two stage rotary vane pump D 30 A, oil diffusion pump DI 3000/6 together with both water cooled and LN2 cooled oil vapour traps, related pneumatically driven valves and fittings, plasmatron for triode cathode sputtering, furnace for preliminary heating of substrates in vacuum (400oC), manipulator with two stages of freedom for substrate’s transport in vacuum, substrate holders, IR lamp for preliminary chamber heating, water cooling system, pneumosystem and “Power supply and control” unit. The “Power supply and control” unit contains of Combined Penning - Pirani vacuum gauge PRNVG 21, Universal programmable process controller UPPC 01, an automatic variable leak valve AVLV 01, MF high voltage generator and plasmatron’s power supply.
TECHNICAL DATA
| Chamber dimensions | mm | 550x580x550 |
| Ultimate pressure | mbar | 2.10-6 |
| Pumpdown time (incl. substrate heating) | min | 30 |
| Power supply | V | 3x380, 50 Hz |
| Power consumption | kVA | 5,5 |
| Cooling water consumption | l/h | 600 |
| Working gas consumption | l/h | 3 |
| Cycle duration (two substrates O120) | min | 120 |
| Weight (app.) | kg | 850 |
AVAILABLE ON REQUEST
1. Vertical cylindrical camber O 500x H350 with lifting.
2. Complete technology for CdSe/CdS photocells production.
HIGH VACUUM PLANT FOR MIRROR AND SEMITRANSPARENT COLOURED ARCHITECTURAL GLASS MASS PRODUCTION
This is a complete line for mirror and semitransparent coloured architectural glass mass production with 300 000 m2 capacity yearly. The whole line includes glass washing machine, glass transport line, high vacuum plant HVP 4 200 T/AE and painting machine (for mirror manufacture). The full automation possibilities are provided. We make the related coatings by using of thermal evaporation of Al from mobile tungsten wire evaporators for mirror production and reactive arc evaporation from mobile cathodes for architectural glass manufacture. The microprocessor controller keeps technological process parameters (evaporation power, time and motion speed of evaporators) constant all time. It provides high quality, tickness uniformity and long term repeatability of the layer’s properties. The coating technologies we use permits producing of different coloured layers by deposition of pure metals and alloys, oxides, nitrides or carbides (optional). It is very important to note, that all manufacture process is environment friendly and power supply saving.
PLANT MIX(general): The production line includes glass washing machine, glass transport line, high vacuum plant HVP 4 200 T/AE and painting machine (for mirror production). The HVP 4 200 T/AE consists of rectangular vacuum chamber 900x1850x2500 mm (internal sizes), single stage rotary piston pump AAC 90, Roots vacuum pump BR 2 100, oil diffusion pump H-400/7000, related pneumatically driven valves and fittings, glow discharge cleaning system, DC motor driven evaporator’s motion system with programmable power supply, three groups of thermal evaporators or three arc evaporators (changeable) with related power supplies (microprocessor controlled, programmable), water cooling system, pneumosystem and “Power supply and control” unit. It contains a combined Penning - Pirani vacuum gauge PRNVG 21, a Universal programmable process controller UPPC 01, Automatic variable leak valve AVLV 01 (optional), Three phase 20 kVA power supply with voltage feedback for thermal evaporation, three 5,5 kVA three phase power supplies for arc evaporators and 2 kVA glow discharge HV power supply.
NOTE: The firm produces mirror and architectural glass using above mentioned equipment.
TECHNICAL DATA (general)
| Glass sizes | mm | 2 100 x 1 600 x 3 - 10 |
| Number of glasses per cycle | pcs. | 6 |
| Ultimate pressure | mbar | 5.10-5 |
| Pumpdown time(2.10-4 mbar) | min. | 12 |
| Cycle duration | min. | 20 |
| Power supply | V | 3 x 380, 50 Hz |
| Power consumption (average) | kVA | 36 |
| Weight | kg | 10 000 |
| Required area (app.) | m2 | 250 |
AVAILABLE ON REQUEST
1. Technologies for different layer’s featuring and multilayer coatings, including oxides, nitrides and carbides.
2. Complete process automation.